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DETAIL INSTRUCTION OF PHOTO-MASK PROCESS |
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Data conversion (CAD process) |
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When we received drawing data, you may send
the whole data in GDS-II(stream) format and if you sent the
partial data (main, alignment, monitor, etc.) we'll make the
layout design. Of course we can make a layout design from a
drawing on paper. And we can write directly not on EB date but
on GDS-IIformat, that save the cost and time for data translation.
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SX9000 |
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LAKES (Our original CAD system) |
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GDS-II(Stream format) |
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DXF |
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EB data |
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floppy disk |
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E|mail |
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Nifty |
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FTP |
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1/4inch CMT |
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MOi230MBA640MBj |
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8mmMT |
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Drawing on paper |
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Pattern generation process |
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After translate customer's design to the data for pattern generation we engrave the
pattern on chrome blanks. And after this process, developing process, etching process,
resist removing process and washing process, then the first step for photo-mask will
be ended.
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Laser reticule writer LRS200 |
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Use laser-beam, can write on the chrome blanks
directly. Blanks size is 4"`9". This equipment can write a pattern
with gradation treatment on software that is a merit of laser-beam
engraver. On the EB equipment curved line will be "step shape"
but use laser equipment that will be round shape. And other
advantage of this equipment is the fine setting for pitch inclement
(0.025micro-meter) and the uniformity on writing. |
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Laser reticule writer OMEGA6060 |
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this is the upper grade equipment of LRS200.
this equipment has 1.5 times throughput and 2times performance.
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Pattern generator LZ340 |
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This equipment has variable apartcher and
write a pattern in square dot form. Maximum blanks size is 18"~20"plate,
and it can write step and repeat in using reticule mask. |
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Basic inspection |
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This is the basic inspection for photo-masks substrate material, name
of mask pattern, layout, top or bottom of substrate surface, scratch, etc.
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Microscopic measure inspection |
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Equipment:Nikon@MPA|3
Optical microscope with micro slit. Scanning enlarged picture
edge by micro slit and measuring automatically with the transition
of transparency. |
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Absolute measure inspection |
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Equipment:lightwave interference
coordinates measuring instrument Nikon@XY-5I
Measure coordinate pattern position, pitch, and micro line width automatically by irradiating laser-beam spot on a mask
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Defect inspection |
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Equipment: Automatic defect inspection machine Lasertech 9MD-82SR /KLA239HR, etc.
This machine inspects the defect by comparing next pattern.
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Equipment: TAMARAC M-155 |
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Exposing on chrome blanks with hard contacting to the master mask.
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